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Home > Japan (5784) > Tokyo (1148) > Chuo-ku (105)
1969: Rodel Inc. founded in Newark, Delaware, USA
1983: Nitta Corporation and Rodel Inc. (currently the Dow Chemical Company) found Rodel Nitta Corporation (our company) as a joint venture
1984: Imports and sales of slurry produced by Nalco Company (via Rodel Inc.) and the SUBA series produced by Rodel Inc. begin, TA (Template Assembly) production begins
1988: With the introduction of new technology, production of the SUBA series of polishing cloths begins
1989: Utilizing our company's technology, production of the MH series of polishing cloths begins, provision of polishing systems to the Rodel Inc. chemical mechanical polishing (CMP) division begins
1992: Utilizing our company's technology, production of the R300 series of mounting film begins
1993: Provision of polishing systems to domestic device manufacturers begins
1995: Rodel Inc. obtains ISO 9001 certification; with the introduction of new technology, construction of a slurry production factory (mainly CMP slurry) in Mie Prefecture is approved
1996: Mie factory completed, Nara factory expanded
1997: Domestic production of CMP slurry begins at Mie factory, ISO 9001 certification obtained
1998: Mie factory expanded (second stage), production of IC1000 CMP pad series begins
1999: Mie factory expanded (third stage)
2000: Rodel Particle Inc. founded
2001: ISO 14001 certification obtained
2003: 20th anniversary of founding, clearing of the planned site of the Kyoto factory completed
2004: Rodel Inc. acquired in a merger, parent company becomes the Rohm and Haas Company, company name changed to Nitta Haas Incorporated, SAP system introduced
2005: Kyoto factory completed, Mie factory expanded (fourth stage)
2006: Relocation from Nara factory to Kyoto factory, Kyoto Technical Center established
2009: Rohm and Haas Company acquired in a merger, parent company becomes the Dow Chemical Company
2013: 30th anniversary of founding
Note: SUBA, MH, and IC1000 are products trademarked by our company.
Business TypeManufacturer
Main ProductsPolishing Pad,Polishing Slurry,Sapphire Polishing Pad,Sapphire Polishing Slussy,Silicon Wafer Polishing
Total No. Employees301 - 500 People
Year Established1998
Annual Output ValueAbove US$100 Million
Factory LocationKyoto Plant: 3-17-1, Kannabidai, Kyotanabe-shi, Kyoto, 610-0333, Japan; Mie Plant: 8-3, Fujigaoka, Fujiwara-cho, Inabe-shi, Mie, 511-0508, Japan
Factory SizeAbove 100,000 square meters
No. of Production LinesAbove 10
Total Annual Sales VolumeAbove US$100 Million
No. of Employees in Trade Department11-20 People
Nearest PortOsaka, Nagoya, KANSAI Int'l Airport
Average Lead Time21 Day(s)
Accepted Delivery TermsFOB, CFR, CIF, EXW, FCA, DDP, DDU, Express Delivery
Accepted Payment CurrencyUSD, JPY
Accepted Payment TypeT/T, L/C, D/P D/A
Language SpokenEnglish, Chinese, Japanese, Korean
Company Website
Telephone8***********5  View all, please login
Street Address8-2-1, Ginza
Zip Code104-0061
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